Micro & Nanofabrication Laboratory & Cleanroom

OBJECTIVES AND SPECIFICATIONS:
– Class 100 (ISO 2) clean room for depositing organic and/or inorganic, conductive, insulating, and semi-conductive materials and etching (wet and dry) in controlled dimensions.
– Fabrication of structures with dimensions from a few nanometers, to hundreds of micrometers on single or multi-level functional structures.
– Multi-level and micro- and nano-system analyses and tests.

AREAS OF IMPACT AND APPLICATIONS:
– Fabrication of micro and nano-system prototypes in a wide field of applications such as communications, health, defense, environment, energy
– Microfluidic circuits for chemical and biological sensor applications (such as chemical and biological sample separator and mixing)
– Capacitive sensors arrays for sensor and Lab-on-a-Chip applications
– Chemical sensor arrays for flammable, explosive and poisonous elements
– Fabrication of RF microelectromechanic circuit elements (RF-MEMS Key, Filter, Resonator e.g.)
– Infrared sensors/detectors
– Capacitive, micro-processed, ultrasonic signal convertor/sensors
– Optical circuit elements (e.g. Resonators, Reflectors, Filters)
– Micro and nano manipulators
– Micro and nano antennas for THz applications
– Inertial sensors/converters/detectors: Gyroscope, Accelerometer

EQUIPMENT LIST
– KLA-TENCOR P6 Surface Profiler
– Semiconsoft Mprobe UV-Vis-NIR Thin film Spectral Reflectance System
– Cascade microtech PM5 Probe Station
– Cascade microtech CP4 4-Point Probe
– Despatch LCD1-16N-3 Photoresist Curing Ovens x4
– Despatch LCD1-16N-3 Polyamide Curing Ovens x2
– Kulicke and Sofa / 4700AD Ball and Wedge Wire Bonder
– Mellen Crystal Growth Furnace
– DISCO DAD 320 Automatic Dicing Saw
– Vistec / EBPG5000plusES Electron Beam Lithography System
– Torr E-beam and Thermal Evaporator
– Torr Plasma Asher
– Oxford PlasmaLab System 100 PECVD
– Oxford PlasmaLab System 100 ICP 300 ICP RIE (III-V and Metal Ething)
– Oxford PlasmaLab System 100 ICP 300 Deep RIE (SiO2,SiNx and Deep Si Etching)
– SSI / Solaris 75-150Rapid Thermal Annealer
– Midas / MDA-60MS Mask Aligner 4”
– Nanovak NVTE4-01 Thermal Evaporator
– Dorutek Electroplating System (Gold and Nickel Electroplating System)
– Dorutek Lithography Wet Bench x 2 (Spinner, Hot Plate, Rinser)
– Dorutek Etching Station (Quartz, Teflon Baths, Ultrasonic Bath, QDR) x3
– Dorutek Wet Bench (Ultrasonic Bath, Bench Top Hot Plate) x1
– Dorutek Fume Hood x1
– Carl Zeiss Optical Microscopes